AVS 66th International Symposium and Exhibition
Event finished. Thank you for participating and we look forward to seeing you again.
AVS 66th International Symposium and Exhibition
October 20 - 25, 2019
Columbus, Ohio, USA
If you are attending AVS, please feel free to stop by our booth or attend talks with our scientists scheduled throughout the week:
Monday, Oct. 21, 10:40 AM, AS
- "Misinterpretations in the Spectroscopic Analysis of Heterogeneous Materials and Defected Structures", L. Swartz
Tuesday, Oct. 22, 2:00 PM, Exhibitor Talks
- "What’s New at PHI", J. Newman
Tuesday, Oct. 22, 5:00 PM, AS
- "Characterization of Electronic Materials using Low Energy Inverse Photoemission Spectroscopy", B. Schmidt
Thursday, Oct. 24, 8:40 AM, AS
- "TOF-SIMS Tandem MS Imaging of (Sub-)Monolayer Coatings for Device Processing", D.M.Carr
Thursday, Oct. 24, 12:00 PM, AS
- "Multi-technique Surface Analysis of Graphenes", K. Artyushkova
Thursday Poster Session
- "Using AES, EDS, and FIB to Detect, Identify, and Image Buried Metallic Particles", A. Ellsworth
Thursday Poster Session
- "XPS, TOF-SIMS, and AES Analysis of Fresh and Aged Alumina-Supported Silver Catalysts", J. Newman